ZrO_2薄膜的X射线光电子能谱分析

Analysis of X-ray Photoelectron Spectroscopy of ZrO_2 Thin Films

用X射线光电子能谱 (XPS)对自制ZrO2 薄膜进行了成分分析 .结果发现 ,在基片有负偏压的条件下 ,薄膜发生了氧缺位现象 ,退火处理可以补偿氧缺位 .在膜表面存在一个Y的偏聚层 .

The composition of the self-made ZrO 2 thin film has been analyzed by XPS(X-ray photoelectron spectroscopy). The results show that when there is negative bias on substrate, the oxygen imperfection would be produced, but it can be compensated by annealing. There is a Y richment layer in the surface layer of the ZrO 2 film. The reasons of these phenomena have also been discussed.