高温超导薄膜GdBa_2Cu_3O_(7-x)的制备和分析

Preparation and Analysis of GdBa_2Cu_3O_(7-x) Superconducting Thin Films

我们用原位直流磁控溅射的方法,在(100)SrTiO_3,(110)SrTiO_3,(100)LaAlO_3和(100)Zr(Y)O_2衬底上制备了高质量外延生长的GdBa_2Cu_3O_(7-s)高温超导薄膜,重复性非常好.在这四种衬底上生长的超导薄膜最高零电阻转变温度 Tco分别为 93.2、93.1、92.6和 92.5K,77K零场下的临界电流密度分别为 3.0 ×10~6,3 × 10~5,3.6 ×10~6和 1.4 × 10~6A/cm^2.我们用扫描电镜(SEM),透射电镜(TEM),反射高能电子衍射(RHEED)和不同几何结构的X射线衍射研究了薄膜的结构,这些研究结果证明薄膜系外延生长的.

High quality epitaxial superconducting thin films of GdBa_2Cu_3O-x have been preparedin situ on (100)SrTiO_3, (110)SrTiO_3,(100)LaAlO_3,(100)Zr(Y)O_2 substrates by dc-magnetronsputtering.The rsproducibility is very good. The best films grown on the four substrates havezero-resistance critical temperature Tco of 93.2, 93.1, 92.6, 92.5K and critical current densityof 3×10~6, 3×10~5, 3.6×10~6, 1.4×10~6 A/cm^3 at 77K, respectively.The film structure were stu-died by scanning electron microscopy(SEM), transmission electron microscopy (TEM), reflec-tion high energy electron diffraction (RHEED) and X-ray diffraction spectra in differentgeometries.The results show that the superconducting thin films are grown epitaxially on thesubstrates.