期刊文献+

宇航用双极器件和光电耦合器位移损伤试验研究 被引量:6

Experimental study on displacement damage of aerospace bipolar and optocoupler devices
下载PDF
导出
摘要 文章针对器件的位移损伤效应,利用质子加速器产生的质子及反应堆中子对化合物器件和硅器件位移损伤进行试验研究,得到了GaAs光电耦合器的电流传输比(CTR)和硅晶体管电流增益hFE的退化率随等效剂量的变化规律。研究结果表明,在质子70 MeV以上高能量范围,对于硅器件适用的位移损伤等效原理对于GaAs化合物器件则不再适用,需要修正。根据试验数据,给出了经验的修正系数。 To study the displacement damage effects,the proton accelerator and the neutron nuclear reactorare used to determine the displacement damage of compound semiconductor devices and silicon devices used forspacecraft.The curves of the degradation vs.the equivalent dose of the CTE of the GaAs optocpupler and thecurrent amplification(hFE)of the silicon transistors are obtained.By analyzing the radiation test data for theoptocoupler and the bipolar transistor,it is concluded that the displacement damage equivalence for the silicondevices is no longer valid for the GaAs compound devices,thus a correction is needed.Empirical correctioncoefficients are then determined according to the test data.
作者 李铮 于庆奎 罗磊 孙毅 梅博 唐民 LI Zheng;YU Qingkui;LUO Lei;SUN Yi;MEI Bo;TANG Min(China Aerospace Component Engineering Center, Beijing 100029, China)
出处 《航天器环境工程》 2017年第1期86-90,共5页 Spacecraft Environment Engineering
基金 国家自然科学基金项目(编号:11475256)
关键词 双极器件 光电耦合器 辐射效应 位移损伤 等效剂量 试验研究 bipolar device optocoupler device radiation effect displacement damage equivalent dose experimental study
  • 相关文献

参考文献2

二级参考文献10

  • 1冯彦君,华更新,刘淑芬.航天电子抗辐射研究综述[J].宇航学报,2007,28(5):1071-1080. 被引量:69
  • 2曾志,李君利,程建平,邱睿.Geant4在核技术领域的应用[J].同位素,2005,18(1):55-58. 被引量:21
  • 3SROUR J R, MARSHALL C J, MARSHALL P W, et al. Review of displacement damage effects in silicon devices [J]. IEEE Trans Nucl Sci, 2003, 50(3): 653-670.
  • 4ASTM E722-04 Standard practice for charac terizing neutron energy fluence spectra in terms of an equivalent monoenergetic neutron fluence for radiation-hardness testing of electronics[S]. West Conshohocken, USA: ASTM, 2007.
  • 5CASWELL R S, COYNE J J, RANDOLPH M L. Kerma factors for neutron energies below 30 MeV[J]. Radiat Res, 1980, 83(2): 217-254.
  • 6OLDHAM T R, MCLEAN F B. Total ionizing dose effects in MOS oxides and devices[J]. IEEE Trans Nucl Sci, 2003, 50(3): 483-499.
  • 7SCHWANK J R, SHANEYFELT M R, FLEETWOOD D M, et al. Radiation effects in MOS oxides[J]. IEEE Trans Nucl Sci, 2008, 55 (4): 1 833-1 853.
  • 8BRISSET C, CAVROIS V F, FLAMENT O, et al. Two-dimensional simulation of total dose effects on NMOSFET with lateral parasitic tran- sistor[J]. IEEE Trans Nucl Sci, 1996, 43(6): 2 651-2 658.
  • 9刘忠立.先进半导体材料及器件的辐射效应[M]{H}北京:国防工业出版社,2008.
  • 10王园明,陈伟,郭红霞,何宝平,罗尹虹,姚志斌,张凤祁,张科营,赵雯.质子核反应二次粒子引起的静态存储器单粒子翻转截面计算[J].原子能科学技术,2010,44(12):1505-1508. 被引量:4

共引文献6

同被引文献59

引证文献6

二级引证文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部