蓝宝石化学机械抛光专利技术分析

Analysis of Patent Technology of Sapphire Chemical Mechanical Polishing

本文首先对蓝宝石化学机械抛光专利申请状况进行概述,然后重点从蓝宝石化学机械抛光装置结构、抛光垫、修整器、CMP停止、抛光液、蓝宝石应用及加工工艺等方面,分析蓝宝石CMP专利技术。

This paper, the patent application status of sapphire chemical mechanical polishing is summarized, and thenthe sapphire CMP patent technology is analyzed from sapphire chemical mechanical polishing device structure, polishing pad, dresser, CMP stop, polishing slurry, sapphire application and processing technology.