精神分裂症患者NLR、氧化应激参数与精神症状的相关性

Association between neutrophil/lymphocyte ratio and psychiatric symptoms in patients with schizophrenia

目的探讨精神分裂症患者中性粒细胞/淋巴细胞比值(NLR)、氧化应激参数与精神症状的相关性。方法选择64例精神分裂症患者和61例健康志愿者,检测并比较两组对象的NLR、总抗氧化状态(TAS)、总氧化状态(TOS)、氧化应激指数(OSI)、对氧磷酶1(PON1)和硫醇(Thiol)水平;采用阳性与阴性症状量表(PANSS)评价精神症状,分析NLR、PANSS评分和氧化应激参数间的关系。结果与健康对照组比较,精神分裂症组NLR、TAS、TOS明显增高(均P<0.05),Thiol、Thiol/OSI明显降低(均P<0.05);两组间PON1、OSI比较,差异均无统计学差异(均P>0.05)。精神分裂症患者PANSS阳性分值与Thiol/OSI呈负相关(r=-0.264);总分值与NLR呈正相关(r=0.251),与Thiol/OSI呈负相关(r=-0.286)。精神分裂症组NLR与Thiol/OSI呈负相关(r=-0.340),健康对照组NLR与Thiol/OSI未见相关(r=-0.040)。精神分裂症患者NLR与TOS、OSI均呈正相关(r=0.361、0.307);Thiol/OSI与TOS、OSI均呈负相关(r=-0.685、-0.678),与TAS、Thiol均呈正相关(r=0.256、0.416)。结论炎症和氧化应激在精神分裂症的发生、发展中起着重要作用,且与患者临床症状关系密切。NLR是一项可以反映精神分裂症患者氧化应激和精神症状信息的简单、廉价、适合常规应用的指标。

Objective To investigate the association between neutrophil/lymphocyte ratio(NLR) and psychiatric symptoms in patients with schizophrenia. Methods Sixty four patients with schizophrenia and 61 healthy volunteers were included in the study. The NLR, total antioxidant status(TAS), total oxidant status(TOS), oxidative stress index (OSI) and paraoxonase 1(PON1) and thiol levels were measured; the psychiatric symptoms were evaluated with positive and negative symptom table(PANSS). The association of psychiatric symptoms with NLR, PANSS score and oxidative stress parameters was analyzed. Results Compared with healthy controls, the NLR, TAS and TOS in schizophrenia group were increased significantly (P<〇.〇5), Thiol and Thiol/OSI were decreased significantly(P<〇.〇5). However, there were no significant differences in PON1 and OSI between two groups(P > 0.05). PANSS positive score was negatively correlated with Thiol/OSI (r=-0.264) in schizophrenic patients, and the PANSS total score was positively correlated with NLR (r=0.251), and negatively correlated with Thiol/OSI (r=-0.286). There was a negative correlation between NLR and Thiol/OSI in schizophrenia group (r=-0.340), but not in control group (r=-0.040). NLR was positively correlated with TOS and OSI in schizophrenic patients (r=0.361, 0.307). Thiol/OSI was negatively correlated with TOS and OSI (r=-0.685, -0.678), and positively correlated with TAS and Thiol (r=0.256, 0.416). Conclusion Inflammation and oxidative stress may be involved in the occurrence and development of schizophrenia, and are closely related to the clinical symptoms of patients. NLR as a simple and inexpensive indicator may be used for assessment of oxidative stress and psychiatric symptoms in patients with schizophrenia.