单源双能量CT在降低金属植入物硬化伪影中的价值

Value of single source dual energy CT in reducing metal implant hardening artifact

目的:探讨单源双能量CT在降低金属植入物硬化伪影中的价值。方法:收治金属植入术后患者30例,采用能谱CT扫描(GSI),分析检查结果。结果:金属硬化伪影AI随ke V增加而降低,不同ke V图像的金属低密度伪影差异无统计学意义(P>0.05),主观评分120 ke V>140 ke V>100 ke V≥80 ke V≥70 ke V,120ke V在降低金属伪影的同时可保证图像更优。结论:能谱CT扫描后重建高ke V单能量图像,能明显减轻金属植入物的硬化伪影度,提高CT图像质量。

Objective:To explore the value of single source dual energy CT in reducing metal implant hardening artifact.Methods:30 patients after metal implantation were selected.They were given energy spectrum CT scan(GSI).We analyzed the results of the examination.Results:Metal hardening artifact AI was decreased with increasing keV.There was no significant difference among different keV images in metal low density artifacts (P>0.05).Subjective score:120 keV>140 keV>100 keV≥80 keV≥70keV.120keV can ensure better image quality while reducing metal artifacts.Conclusion:The reconstruction of high keV single energy image after CT scanning can significantly reduce the metal implant hardening artifact and improve the quality of CT images.