摘要
本文采用磁控溅射法制备了用于电致变色器件的WO_3薄膜,用X射线衍射仪(XRD)、场发射扫描电镜(FE-SEM)、紫外-可见分光光度计(UV-Vis)对其物相组成、微观形貌以及电致变色性能进行了表征。结果表明:在溅射压强为2 Pa、氩氧比为60:20时所制备的WO_3薄膜厚度适中,且有利于离子的嵌入/脱出,而以此薄膜制备的电致变色器件光调制范围最大,褪色时间最短,着色效率达82.9 cm^2/C。
In this paper,WO3films for electrochromic devices were prepared by magnetron sputtering.The phase composition,microstructure and electrochromic properties were characterized by X-ray diffraction(XRD),field emission scanning electron microscope(FE-SEM)and ultraviolet-visible spectrophotometer(UV-Vis).The results showed that WO3films prepared at the sputtering pressure of2Pa and argon/oxygen ratio of60:20were suitable for the intercalation/deintercalation of ions,and the electrochromic devices prepared by this thin film showed maximum range of modulation,the shortest fade time,and the coloring efficiency reached to82.9cm2/C.
作者
汤全丰
李海增
王宏志
张青红
李耀刚
陈培
TANG Quan-Feng;LI Hai-Zeng;WANG Hong-Zhi;ZHANG Qing-Hong;LI Yao-Gang;CHEN Pei(Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China)
出处
《现代技术陶瓷》
CAS
2017年第2期142-149,共8页
Advanced Ceramics
基金
广东省科技计划(2016B090932003)
关键词
磁控溅射
WO3薄膜
电致变色器件
氩氧比
Magnetron sputtering
WO3 thin film
Electrochromic device
Ar/O2 ratio
