硼硅丙烯酸酯合成及真丝织物接枝改性

Synthesis of borane-silicon containing acrylate and grafting modification on silk fabrics

1-甲基丙烯酰氧乙氧甲基碳硼烷通过还原、取代反应得到目标化合物1-甲基丙烯酰氧乙氧甲基-2-(1,1,1,3,3-五甲基二硅氧烷基)碳硼烷(PMASC)。以FT-IR和1H NMR鉴定了目标化合物PMASC的结构,并用其对真丝织物进行接枝改性。通过FT-IR和SEM测试表明PMASC已成功接枝到真丝织物上,采用TGA、DSC和MCC对接枝前后真丝织物的热性能进行了分析。当接枝率为34.4%时,800℃下接枝真丝织物的质量残余率为34.2%,并且热分解的吸热峰向较高温度(343℃)移动。结果表明,使用含硼硅单体接枝可以改善真丝织物的耐热性。

The target monomer1-methacryloxyethyloxamethyl-2-(1,1,1,3,3-pentamethyldisiloxanyl)carborane(PMASC)was successfully prepared by reduction and substitution reaction,using1-methacryloxyethyloxamethyl carborane as raw material.The monomer PMASC was characterized by FT-IR and1H NMR andthen used to modify silk fabrics.The results of FT-IR and SEM confirmed that the target monomer had beengrafted onto silk fabrics.The thermal stability of silk was estimated by TGA,DSC and MCC analysis.When thegraft yield was34.4%,the mass retention of grafted silk fabric was up to34.2%under800℃and the endothermic peak for the thermal decomposition shifted toward higher temperature(343℃).It could be observedthat the silk fabrics with higher graft yield exhibited greater heat-resistance.