摘要
本文制备了一种含有偶氮苯基团的阴离子表面活性剂,其表面活性及对方解石矿物的润湿性能,可以用紫外光照射进行调控。在紫外光照射后,表面活性剂的临界胶束浓度(cmc)、最低表面张力(γcmc)、分子极限占有面积(Amin)增大,饱和吸附量(Гmax)和降低表面张力的效率(pC20)降低,对方解石的润湿能力增强。
A kind of photosensitive anionic surfactant was synthesized using4-butylaniline,ethyl bromacetate andphenol.Its structure was identified by1HNMR and its properties were also measured.It was found that photoisomerization of the surfactant occurred under the irradiation of ultraviolet light and its time to make balance was about40min.After the irradiation of ultraviolet light,the values of cm c^and increased and the values of,pC^.and the contact angle on thecalcite surface decreased.
作者
支引娟
姜小明
郝春玲
ZHI Yinjuan;HAO Chunling;JIANG Xiaoming(Department of Chemistry and Chemical Engineering, Guizhou University , Guiyang 550025, Guizhou, P. R. China;College of Agriculture , Guizhou University , Guiyang 550025, Guizhou, P. R. China)
出处
《影像科学与光化学》
CAS
CSCD
北大核心
2017年第6期861-867,共7页
Imaging Science and Photochemistry
基金
贵州省科学技术基金项目(20132097)
贵州省工业攻关项目(20103014)
贵州省教育厅自然科学研究项目(2011022)
贵阳市工业振兴科技计划项目(20111014-11)资助
关键词
光敏
偶氮苯
表面活性剂
光异构化
表面张力
接触角
photosensitive
azobenzene
surfactant
photoisomerization
surface tension
contact angle
