靶电流密度对热丝增强等离子磁控溅射制备Cr_2N薄膜结构与性能的影响

Effect of target current density on the structure and property of the Cr_2N films deposited by hot wire plasma enhanced magnetron sputtering

采用等离子体增强平衡磁控溅射技术在316L奥氏体不锈钢基体表面制备了不同靶电流密度条件下的Cr_2N薄膜,并检测分析了靶电流密度对薄膜表面形貌、相结构、力学性能、膜基结合力和摩擦磨损性能的影响。结果表明,薄膜呈致密柱状结构,以Cr_2N(111)择优取向为主。当靶电流密度为0.132 mA/mm^2时,WN相与Cr_2N并存;随着靶电流密度的增加,薄膜厚度逐渐增加,硬度、弹性模量略有下降,膜基结合增强。薄膜与基体结合处呈脆性失效。靶电流密度0.132 mA/mm^2时,最高薄膜硬度及模量分别为33及480GPa,且磨损量最小。靶电流密度0.264mA/mm^2时,最大膜机结合力为36.6N。经过镀Cr_2N薄膜后,试样表面硬度、耐磨性明显提高。

The Cr2N films were deposited by hot wire plasma enhanced magnetron sputtering(PEMS)on substrate of316L austenitic stainless steel at different target current density.The effect of target current density on the morphology,phase structures,mechanical properties,adhesion between film and substrate and abrasive resistance of Cr2N films were investigated in this paper.The results showed that the main preferred orientation of the dense columnar Cr2N films was(111),and together existed of WN(101)for the film deposited at the low target current density of0.132mA/mm2.With increasing target current density,the deposition rate of the films increased,the nano-hardness and Young’s modulus decreased and the adhesion between film and substrate increased.The Rockwell indentation fracture indicated brittle failure of the bonding between the film and substrate.The maximum nano-hardness and modulus of the film deposited at lowest target current density of0.132mA/mm2were33and450GPa,respectively,and the wear resistance was the highest.The maximum adhesion between film and substrate of the film deposited at the highest targets current density of0.264mA/mm2was36.6N.The hardness and wear resistance of the316L steel were improved significantly after coated with Cr2N films.