基于胶体晶体构筑银纳米薄膜及其抑制微放电性能研究

Construction of Silver Film by Colloidal Crystal Template and Its Micro-discharge Inhibition Performance

近年来,微放电效应的抑制研究在加速器、大功率微波器件等领域得到了广泛的关注。采用聚苯乙烯(PS)胶体晶体模板辅助磁控溅射法制备了类空心球结构的银薄膜,通过调节PS模板尺寸及溅射时间(镀银层厚度),得到具有抑制微放电效应的银薄膜。采用SEM表征银薄膜的形貌与结构,并用二次电子发射系数(SEY)测试平台表征银薄膜的SEY。结果表明,PS模板尺寸及溅射时间对银薄膜形貌及其二次电子抑制作用有显著的影响,当溅射时间为600s,模板尺寸为1 000nm时,银薄膜的SEY较小,即对二次电子的抑制作用较为显著,与初始镀银铝合金样品相比,其SEY值降低了48%。

In recent years,multipactor suppression has been widely concerned in the accelerator,high-power microwave devices and other related fields.In this study,hollow sphere-like silver film was obtained via magnetron sputtering assisted by polystyrene(PS)colloidal crystal template.The second electron suppression effect of the silver film was adjusted by the size of PS template and the sputtering time(thickness of the silver layer).The morphology of silver films was characterized by SEM,and the SEY of silver films was characterized by secondary electron emission(SEY)test platform.The results show that size of PS template and sputtering time have significant effect on the morphology of silver film and its secondary electron suppression.When the sputtering time was 600 s and the template size was 1 000 nm,the maximum SEY of the silver film was relatively low,which meant the second electron suppression effect was more significant.Compared with the initial silver-plated aluminum alloy samples,the SEY value decreased by 48%.