摘要
成功开发超厚介质膜的淀积和刻蚀工艺、超厚金属铜的电镀和化学机械研磨等工艺,采用与CMOS完全兼容的铜互连单大马士革工艺制作了超厚金属铜集成电感。该超厚金属铜电感在1~3 GHz频率范围内的电感值均匀,在2.5 GHz频率下的Q值达到11。并且进一步研究了线圈圈数、金属线宽和金属间距对电感值和Q值的影响。
The technology of deposition and etching of super thick dielectric film,electrochemical plating(ECP)of super thick copper and chemical-mechanical polishing(CMP)were successfully developed in this paper.Super-thick copper integrated inductors were fabricated using copper-interconnected Single Damascus processes that are fully CMOS compatible.The inductance of the super thick copper inductor is uniform in the range of 1~3 GHz,and the Q value at 2.5 GHz is 11.In addion,the influence of coil number,metal line width and metal distance on the value of inductance and Q is further studied.
作者
曾绍海
陈张发
李铭
ZENG Shaohai;CHEN Zhangfa;LI Ming(Shanghai IC R&D Center,Shanghai 201210,China)
出处
《集成电路应用》
2018年第4期51-54,共4页
Application of IC
基金
国家重大专项课题(2011ZX02702_004)
关键词
集成电路制造
工艺开发
单大马士革
铜电感
品质因子Q
IC manufacturing
process development
single damascene
copper inductor
quality factor Q