基于通带扩展的超宽带减反射膜制备技术

Ultra-wideband Antireflection Film Preparation Technology Based on Passband Expansion

现代综合性光学仪器往往是一机多用,光学系统的工作波段可能要覆盖紫外、可见、微光、近红外、短波红外甚至中、远红外等。这样的光学系统往往比较复杂,涵盖光学零件类型较多,镜面累计光能损失、杂散光现象严重,光能的损失及杂散光的传播,造成了像的亮度降低,像的衬度降低,像的分辨率下降,为了获得良好的光学系统性能,需要在其光学零件表面镀制超宽带减反射膜。而这种膜系通常需要较多的层数和较多种膜料的组合才能实现,设计和镀制难度都很大。文中提出了一种利用通带扩展方法设计超宽带减反射膜,选用Ta2O5、SiO2两种膜料组合,实现了0.42~0.9μm,Rave≤1.6%,1.064±0.01μm,Rave≤1%,1.57±0.01μm,Rave≤1%,超宽光谱区域减反射效果,镀制膜层质量满足JB/T8226.1-1999检测标准。

Modern integrated optical instruments often have many functions,the working bands of optical sys?tems may cover ultraviolet,visible,glimmering,near infrared,shortwave infrared,even mid-infrared and far-infra?red wavebands.Such optical systems are often more complex,containing more types of optical parts,there is loss of light energy in the mirror and severe stray light,which results in lower brightness,contrast and image resolution.In order to obtain good optical system performances,ultra-wideband antireflection coating is needed on the surface of the optical parts.This film system usually needs more layers and combinations of many kinds of film materials,the design and deposition are very difficult.A kind of ultra-wideband antireflection film designed with passband expan?sion method is proposed.Two kinds of material combination such as Ta2O5 and SiO2 are selected to obtain antireflec?tion effect at ultra-wideband,so we can get the Rave is less than 1.6%at 0.42~0.9μm,Rave is less than 1%at 1.064±0.01μm and Rave is less than 1%at 1.57±0.01μm.The quality of the desposition film meets JB/T8226.1-1999 standards.