摘要
对不同偏置状态下的国产科学级0.18μm工艺掩埋型4T-CMOS有源像素图像传感器进行钴-60γ射线辐照和退火实验,研究总剂量效应对图像传感器的性能影响,并观察是否存在总剂量偏置效应。着重分析暗电流、满阱容量等参数随累积剂量的变化规律。实验结果表明随着辐照总剂量累加,暗电流前期缓慢增长,之后退化明显加剧,这主要是由于辐照致界面态和氧化物陷阱电荷密度增加。4T-CMOS图像传感器的暗电流主要由来源于STI界面,而辐照导致耗尽区展宽与STI接触使得暗电流增长加剧,同时,辐照导致的耗尽区展宽也引起满阱容量的下降。并且在4T-CMOS图像传感器的实验中没有发现明显的总剂量偏置效应。
To study the effect of total dose effect and biasing effect on image sensor performance,Cobalt-60 gamma ray irradiation and annealing experiments were carried out on 0.18μm process buried 4T-CMOS active pixel image sensor under different bias conditions.Emphasis was placed on the variation of parameters such as dark current and full well capacity with cumulative dose.The experimental results show that with the accumulation of total dose of irradiation,the dark current increases slowly in the early stage,and then the degradation is obviously aggravated.The main source of dark current in 4T-CMOS image sensor currents from STI interface and depletion width increase touching to STI,which aggravates degradation of dark current.Full well capacities have a drop after irradiation,which was due to the the photodiode capacitance decreases when the depletion width increases induced by radiation.And there is no remarkable biasing effect at 4T-CMOS image sensor.degradation of dark current.
作者
马林东
李豫东(指导)
郭旗
文林
周东
冯婕
Ma Lindong;Li Yudong;Guo Qi;Wen Lin;Zhou Dong;Feng Jie(Key Laboratory of Functional Materials and Devices for Special Environments of Chinese Academy of Sciences,Xinjiang Technical Institute of Physics and Chemistry,Chinese Academy of Sciences,Urumqi 830011,China;Xinjiang Key Laboratory of Electronic Information Material and Device,Urumqi 830011,China;University of Chinese Academy of Sciences,Beijing 100049,China)
出处
《红外与激光工程》
EI
CSCD
北大核心
2018年第10期309-313,共5页
Infrared and Laser Engineering
基金
国家自然科学基金(11675259);中国科学院青年创新促进会和新疆维吾尔自治区青年科技创新人才培养工程(qn2015yx035)。
关键词
CMOS有源像素传感器
总剂量效应
暗电流
CMOS active pixel sensor
total ionizing dose radiation effect
dark current