不同溅射功率下PEN/Ti纳米复合薄膜的制备及性能研究

Research on the preparation and properties of PEN/Ti nanocomposite films under different sputtering power

采用直流磁控溅射法,在溅射气压为7.0×10^(-1) Pa和不同溅射功率(72～144W)下,制备出PEN/Ti纳米复合薄膜。研究了不同溅射功率对Ti膜微观组织、表面粗糙度、硬度及生长方式的影响规律。结果表明,直流磁控溅射法在PEN柔性衬底上沉积的钛膜是一种纳米多晶薄膜;随着溅射功率的增加,钛膜沉积速率及钛膜弹性模量皆升高,而钛膜表面粗糙度与钛膜晶粒尺寸均减小;溅射功率的增加将抑制钛膜柱状生长方式。在溅射气压为7.0×10^(-1) Pa,溅射功率为144 W时的工艺参数下,获得性能最佳的复合薄膜。

PEN/Ti nanocomposite films were prepared by DC magnetron sputtering at 7.0×10-1 Pa and different sputtering power(72-144 W).The effects of sputtering power on the microstructure,surface roughness,hardness and growth mode of the Ti films were studied.The results show that Ti film deposited on PEN flexible substrate by DC magnetron sputtering is a kind of nano-polycrystalline film.Besides,the deposition rate and the elastic modulus of Ti films increase with sputtering power increasing,while the surface roughness and the grain size of the Ti films decrease.Meanwhile,the mode of columnar growth is inhibited with the increase of sputtering power.When the sputtering pressure is 7.0×10-1 Pa and the sputtering power is 144 W,the composite film with the best properties is obtained.