柔性Ni网基底上电沉积制备ZnO纳米结构薄膜及其光电性能研究

Preparation and Photoelectric Characteristics of ZnO Nanostructure Film Electrodeposited on Flexible Ni Mesh

以ZnCl_2与O_2为原料,通过电化学沉积在柔性金属Ni网基底上制备了ZnO纳米棒阵列,对初级结构表面进行铺膜处理,并于-1. 0 V下沉积3 600 s得到纳米"花状"分级结构。利用扫描电子显微镜(SEM)、X射线衍射(XRD)、透射电子显微镜(TEM)等手段对合成样品的形貌、物相、结构进行了表征,研究不同制备条件对ZnO纳米薄膜形貌及光电性能的影响。结果表明,初级结构ZnO纳米棒经铺膜退火处理后,表面可形成均匀的纳米粒子晶种层,为次级结构的生长提供活性位点。再次电沉积后,生成的"花状"分级结构相比于一维纳米棒具有更大的比表面积,能够有效提高N719染料的吸附量,其光电转换效率也相应由0. 52%增大至0. 80%。

ZnO nanorod arrays were prepared by electrochemical deposition on a flexible metal Ni mesh substrate by ZnCl2 and O2.The surface of the primary structure was then coated and deposited at-1.0 V for 3 600s to obtain nanoflowered hierarchical structure.The morphology,phase and structure of the synthesized samples were characterized by scanning electron microscopy(SEM),X-ray diffraction(XRD)and transmission electron microscopy(TEM).The morphology and photoelectric performance of ZnO nanostructure affected by different preparation conditions were investigated.The results show that the primary structure ZnO nanorods can form a uniform nanoparticle seed layer after annealing,and provide active sites for the growth of secondary structures.After re-deposition,the resulting"flower-like"hierarchical structure has a larger specific surface area than the one-dimensional nanorods,which can effectively increase the adsorption amount of N719 dye,and its photoelectric conversion efficiency also increases from 0.52% to 0.80%.