一种彩膜光刻胶实验室涂膜均匀性研究

Study on Film Uniformity of Color Film Photoresist in Laboratory

目前旋转涂膜仍是光刻胶实验室评价最主要的方法。从玻璃基板的尺寸、匀胶设备及人员作业细节等方面研究如何有效提升实验室光刻胶评价时涂膜的均匀性及重复性,确保检测数据的稳定性、准确性。其中在玻璃基板的尺寸从8 cm*8 cm变为15 cm*15 cm,同时在旋涂设备设置Slope时,涂膜均一性由6.5%提升至1.5%的水平,满足客户对高品质光刻胶的检测要求。

Rotary coating is still the most important method for laboratory evaluation of photoresist.This paper mainly studies the size of glass substrate,the leveling equipment and the details of personnel operation,so as to improve the uniformity and repeatability of coating in laboratory photoresist evaluation and ensure the stability and accuracy of testing data.The size of glass substrates changed from8cm*8cm to15cm*15cm,and the uniformity of the film increased from6.5%to1.5%when the spinning equipment was equipped with Slope,which met the customer's requirements for high-quality photoresist testing.