摘要
集成电路光刻作为传统光刻技术的典型代表,支撑着集成电路芯片的快速发展。新一代光刻技术具有工艺多样化、光刻精度高、光刻效率高的优点,在研发新型光电子器件、实现3维微纳结构、构建有序纳米孔通道等方面有很大的潜力。回顾了近些年来涌现的多种新型光刻技术,分析了各自的特征及在新型纳米电子、光子器件、能源、传感等领域中的应用。对未来光刻技术的发展方向进行了展望。
Integrated circuit(IC)lithography,as a typical representative of traditional lithography technology,supports the rapid development of integrated circuit chips.The new generation of photolithography technology has the advantages of diverse technology,high precision and high efficiency.It has great potential in the development of optoelectronic devices,the realization of3-D micro-nano structure,and the construction of the ordered nanoscale channels.A variety of new photolithography technologies in recent years have been reviewed.Their characteristics and their applications in nanoelectronics,photonic devices,energy,sensing and other fields have been analyzed.Finally,the development direction of lithography technology in the future is prospected.
作者
何立文
罗乐
孟钢
邵景珍
方晓东
HE Liwen;LUO Le;MENG Gang;SHAO Jingzhen;FANG Xiaodong(School of Electronics and Applied Physics, Hefei University of Technology, Hefei 230009, China;Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China)
出处
《激光技术》
CAS
CSCD
北大核心
2019年第1期30-37,共8页
Laser Technology
关键词
激光技术
光学制造
新型光刻技术
无掩模光刻
掩模光刻
微纳结构
laser technique
optical fabrication
new lithography technology
maskless lithography
mask lithography
micro-nano structure
