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La_2O_3对TA2钛电解渗硼的影响 被引量:4

Effect of La_2O_3 on Electrolytic Boronizing of TA2 Titanium
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摘要 以无水硼砂为渗硼剂、K_2CO_3为活化剂、B_4C为供硼剂、La_2O_3为添加剂,对TA2金属钛进行电解渗硼,研究La_2O_3对渗硼层形貌的影响。结果表明,硼化层由表面层的Ti B_2和次外层的Ti B晶须组成。在相同渗硼工艺条件下,不添加La_2O_3时,Ti B晶须长度为92.61μm,Ti B_2厚度为6.38μm;添加5%、10%和15%La_2O_3后,Ti B晶须长度分别为100.39、121.65和144.83μm,Ti B_2厚度分别为5.83、5.28和5.30μm,La_2O_3的加入促进了Ti B晶须的生长,但降低了Ti B_2层厚度。 Effect of La2O3 on the morphology of boronised layer was studied by electrolytic boronising of TA2 titanium using anhydrous borax as boronising agent, K2CO3 as activator and B4C as donor. The results showed that the boronised layer was comprised of surface TiB2 and inner TiB whiskers. Without addition of La2O3, the length of the TiB whiskers was 92.61 μm and the thickness of the TiB2 was 6.38 μm under the same boronising conditions. After adding 5%, 10% and 15% of La2O3, the length of the TiB whiskers was 100.39, 121.65 and 144.83 μm, respectively, and the thickness of the TiB2 was 5.83, 5.28 and 5.30 μm, respectively. It is shown that the addition of La2O3 promoted the growth of TiB whiskers, but reduced the thickness of TiB2.
作者 黄有国 张晓辉 陈家荣 苏晨 吴强 王红强 李庆余 HUANG You-guo;ZHANG Xiao-hui;CHEN Jia-rong;SU Chen;WU Qiang;WANG Hong-qiang;LI Qing-yu(Guangxi Normal University,Guilin 541004,Guangxi,China;Hezhou University,Hezhou 542800,Guangxi,China)
出处 《矿冶工程》 CAS CSCD 北大核心 2018年第6期131-133,138,共4页 Mining and Metallurgical Engineering
基金 国家自然科学基金(21473042) 广西科学研究与技术开发计划(桂科AA16380042) 桂林市科学研究与技术开发计划(2016010502-2)
关键词 LA2O3 电解渗硼 TIB2 TIB La2O3 titanium electrolytic boronizing TiB2 TiB
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