N2流量对脉冲溅射CrNx薄膜结构和耐蚀性的影响

Effect of N_2 Flow Rate on Microstructure and Corrosion Resistance of Pulse Sputtering CrN_x Thin Films

采用脉冲磁控溅射法在不同氮气流量下制备出CrN_x薄膜,并利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、能谱仪(EDS)和电化学工作站对薄膜进行了系统分析,以研究氮气流量对其微观结构和耐蚀性的影响规律。结果表明:氮气流量较低时,薄膜的物相为Cr_2N^+CrN的复合相,当氮气流量增加至150sccm,物相转变为CrN单相;表面和截面形貌照片显示,随着氮气流量的增多,薄膜的表面粗糙度逐渐减小、致密度也得到改善。物相的变化和致密度的改善,使得腐蚀电流密度随氮气流量的增加而降低,即腐蚀速度逐渐减小,当氮气流量为150sccm时薄膜表现出最好的耐蚀性。

CrNx thin films were prepared by pulsed magnetron sputtering at different N2 flow rates. And the films were tested systematically by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectrometer (EDS) and electrochemical workstation responsively, to study the effect of N2 flow rate on the microstructures and corrosion resistances of the films. The results show that the phase of the film is Cr 2N +CrN composite phase when the N2 flow rate is samll, and the phase changes to CrN single phase as N2 flow rate increases to 150 sccm. By observing the surface and cross-section morphology of the films, it is found that the surface roughness and the compactness improve gradually with the increase of N2 flow rate. Due to the change of the phase and the improvement of the compactness, the corrosion current densities of the films decrease with the increase of N2 flow rate, which means that the corrosion rate decreases. The corrosion resistance of the film is best when N2 flow rate is 150 sccm.