摘要
本文通过对过期MaskBlank原材进行二次烘烤,发现此举对改善因blank原材过期所导致的白缺陷效果明显,不仅缺陷数量得到大幅的减少,同时缺陷尺寸大小也有明显的减小;进而通过多次实验,对比验证了曝光前二次烘烤、曝光后二次烘烤、显影后二次烘烤对改善白缺陷效果的差异,以及有无其它负面影响、负面影响可消除难易程度。通过实验发现,曝光后的烘烤,效果最佳,不仅白缺陷数量和尺寸都大幅减少,而且负面影响小,且所带来的负面影响可以有效去除,该方案具有运用到实际的工作中的价值。
By twice baking the overdue Mask Blank raw material, we found that this method has obvious effect on improving the white defects caused by the overdue blank raw material, not only the number of defects has been greatly reduced, but also the size of defects has been significantly reduced. Furthermore, through many experiments, the two baking pairs before exposure, two baking after exposure and two baking pairs after development have been compared and verified. Improving the difference of the effect of white defect, and whether there are other negative effects and negative effects can eliminate the degree of difficulty. Experiments show that the exposure baking has the best effect, not only the number and size of white defects are greatly reduced, but also the negative effects are small, and the negative effects can be effectively removed. This scheme has the value of application in practical work.
作者
司继伟
黄国勇
Si Jiwei;Huang Guoyong(Shenzhen Luwei Photoelectric Co., Ltd.,Shenzhen Guangdong, 518057)
出处
《电子测试》
2019年第4期51-52,共2页
Electronic Test