企业用小型超纯水制备系统的最适工艺选择探讨

Study on the Selection of Optimal Process of Small Ultra-pure Water Preparation System for Enterprises

半导体企业对生产用水的水质要求极高,该行业快速发展对超纯水系统的需求日趋旺盛。超纯水系统的投资成本和运行成本远高于其它水处理系统,且工艺运行的稳定性要求高,企业用户难以选择。为此,本文以某半导体企业的超纯水站为例,从工艺路线、投资和运行成本、运行管理和二次污染治理等方面探讨了针对基于18MΩ.cm水质要求的小水量超纯水制备系统的最适工艺系统。结果表明:采用两级RO结合EDI制备超纯水在一次性投资费用、运行费用、自动控制与管理、二次污染排放等方面更有优势,将成为未来半导体行业小型超纯水站的主流工艺。

Semiconductor companies have extremely high requirements for the quality of production water. With the rapid development of this industry, the demand for ultra-pure water systems is increasingly strong. The investment cost and operating cost of ultra-pure water system are much higher than other water treatment systems, and the stability of the process operation is required to be high, making it difficult for enterprise users to choose. Therefore, this paper took a pure water station of a semiconductor enterprise as an example, and discussed the optimum process system of small-volume ultra-pure water based on 18MΩ.cm water quality requirements from the aspects of process route, investment and operation cost, operation management and secondary pollution control. The results showed that the use of two-stage RO combined with EDI to prepare ultra-pure water has advantages in investment cost, operating cost, automatic control and management, and secondary pollution discharge. It will become the mainstream process for small ultra-pure water station in the semiconductor industry in the future.