倍频微脉冲复合高功率磁控溅射TiCN薄膜结构及性能研究

Preparation of TiCN Film by Multiple Micro-pulse High Power Magnetron Sputtering and Its Properties

如何提高高功率磁控溅射技术(HIPIMS)的沉积速率一直是PVD领域的研究热点,微脉冲复合高功率磁控溅射技术由于其在常规HIPIMS的单脉冲内耦合多个微脉冲,不仅进一步激励等离子体放电,更有效降低了磁控靶回吸现象,有利于提高HIPIMS的沉积速率。利用微脉冲复合高功率磁控溅射技术制备TiCN薄膜,系统研究了乙炔(C2H2)流量对TiCN薄膜结构性能的影响。采用扫描电子显微镜、Raman光谱、球-盘式摩擦磨损试验机、电化学分析仪分别表征薄膜截面形貌、结构、摩擦磨损性能、电化学腐蚀性能,结果表明:随着乙炔气体流量升高,TiCN薄膜沉积速率增加,摩擦系数先变小后不变,磨痕宽度先减小后增大,乙炔流量为1.4 mL/min时磨痕宽度最小为80.4μm,TiCN薄膜耐蚀性减弱,在乙炔流量0.8 mL/min时耐蚀性最好。

The TiCN films were prepared by multiple micro-pulse high power magnetron sputtering technique. The HIPIMS work voltage was 430 V, the ignition pulse voltage was 750 V, and the ignition pulse number was 3 constantly. Influence of C2H2 gas flow on the structure and properties of TiCN films was studied. Cross-section morphology, structure, friction and wear performance, electrochemical corrosion resistance were respectively characterized by SEM, Raman spec-troscopy, ball-disk friction and wear tester and electrochemical analyzer. The results show that with the increase of C2H2 gas flow rate, the deposition rate of TiCN film increased and the friction coefficient firstly decreased. Moreover, the wear width first decreased and then increased and the corrosion resistance of TiCN film declined initially and then remain stable. When the C2H2 of gas flow rate was 1.4 mL/min, the wear width was 80.4 μm.