摘要
采用化学溶液沉积法在Si衬底上生长立方结构的δ-Nb-Ti-N薄膜和δ-NbN薄膜,系统研究了掺杂前后薄膜颗粒度/晶粒度、微应力、N含量、载流子浓度及迁移率对超导转变温度、正常态电阻率和上临界场等的影响。得到如下结果:Ti组分的掺杂,使δ-Nb-Ti-N薄膜的晶格常数增大,晶粒尺寸减小,正常态电阻率升高,载流子浓度增大,超导转变温度T_C升高,根据BCS理论和GL方程进行综合分析,B_(C2)(0)由T_C、N和晶粒尺寸共同影响,总的结果为Ti组分的掺杂使B_(C2)(0)升高。
δ-Nb-Ti-N andδ-NbN thin films with cubic strcture were fabricated using chemical solution deposition in the study.The effects of particle size/grain size,microstrain,N content,electron carrier concentration and electron mobility on superconducting transition temperature,normal state resistivity and upper critical field before and after Ti doping were systematically investigated.The results showed that the lattice constant of theδ-Nb-Ti-N thin film is improved,the grain size decreases,the normal state resistivity increases,the N content,the carrier concentration increases,the superconducting transition temperature T C increases.According to BCS theory and GL equation,the upper critical field B C2(0)is affected by T C,N and grain size.The total result is that the doping of Ti component increases the upper critical field B C2(0).
作者
惠贞贞
王彦平
叶祥桔
汪徐春
郭雨
HUI Zhen-zhen;WANG Yan-ping;YE Xiang-ju;WANG Xu-chun;GUO Yu(School of Chemistry and Material Engineering,Anhui Science and Technology University,Fengyang,233100,Anhui)
出处
《蚌埠学院学报》
2019年第2期34-38,共5页
Journal of Bengbu University
基金
国家自然科学基金(1180041106)
安徽省自然科学基金(1808085QE141)
安徽科技学院人才引进项目(HCYJ201705)
安徽省科技重大专项基金(18030901087)
关键词
δ-Nb-Ti-N薄膜
化学溶液沉积法
超导转变温度
正常态电阻率
上临界场
δ-Nb-Ti-N thin films
chemical solution deposition
superconducting transition temperature
normal state resistivity
the upper critical field