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Improving the data retention of phase change memory by using a doping element in selected Ge_2Sb_2Te_5

Improving the data retention of phase change memory by using a doping element in selected Ge_2Sb_2Te_5
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摘要 The crystallization characteristics of a ubiquitous T-shaped phase change memory(PCM) cell, under SET current pulse and very small disturb current pulse, have been investigated by finite element modelling. As analyzed in this paper, the crystallization region under SET current pulse presents first on the corner of the bottom electron contact(BEC) and then promptly forms a filament shunting down the amorphous phase to achieve the low-resistance state, whereas the tiny disturb current pulse accelerates crystallization at the axis of symmetry in the phase change material. According to the different crystallization paths, a new structure of phase change material layer is proposed to improve the data retention for PCM without impeding SET operation.This structure only requires one or two additional process steps to dope nitrogen element in the center region of phase change material layer to increase the crystallization temperature in this confined region. The electrical-thermal characteristics of PCM cells with incremental doped radius have been analyzed and the best performance is presented when the doped radius is equal to the radius of the BEC. The crystallization characteristics of a ubiquitous T-shaped phase change memory(PCM) cell, under SET current pulse and very small disturb current pulse, have been investigated by finite element modelling. As analyzed in this paper, the crystallization region under SET current pulse presents first on the corner of the bottom electron contact(BEC) and then promptly forms a filament shunting down the amorphous phase to achieve the low-resistance state, whereas the tiny disturb current pulse accelerates crystallization at the axis of symmetry in the phase change material. According to the different crystallization paths, a new structure of phase change material layer is proposed to improve the data retention for PCM without impeding SET operation.This structure only requires one or two additional process steps to dope nitrogen element in the center region of phase change material layer to increase the crystallization temperature in this confined region. The electrical-thermal characteristics of PCM cells with incremental doped radius have been analyzed and the best performance is presented when the doped radius is equal to the radius of the BEC.
出处 《Journal of Semiconductors》 EI CAS CSCD 2019年第4期29-34,共6页 半导体学报(英文版)
基金 support of the"Strategic Priority Research Program"of the Chinese Academy of Sciences(No.XDA09020402) the National Integrate Circuit Research Program of China(No.2009ZX02023-003) the National Natural Science Foundation of China(Nos.61261160500,61376006,61401444,61504157) the Science and Technology Council of Shanghai(Nos.14DZ2294900,15DZ2270900,14ZR1447500) the National Natural Science Foundation of China(61874178)
关键词 phase change memory CRYSTALLIZATION process SET CURRENT PULSE small disturb CURRENT PULSE finite ELEMENT simulation phase change memory crystallization process SET current pulse small disturb current pulse finite element simulation
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