期刊文献+

寄生电感对低压增强型GaN HEMT开关行为的影响 被引量:1

Influence of Parasitic Inductance on Switching Behavior of Low Voltage E-Mode GaN HEMT
下载PDF
导出
摘要 寄生电感是影响功率管开关特性的重要因素之一,开关频率越高,寄生电感对低压增强型氮化镓高电子迁移率晶体管(GaN HEMT)的开关行为影响越深,使其无法发挥高速开关的性能优势。通过建立数学模型,理论分析了考虑各部分寄生电感后增强型GaN HEMT的开关过程,并推导了各阶段的持续时间和影响因素,然后通过建立双脉冲测试平台,对各部分寄生电感对开关特性的具体影响进行了实验验证。实验结果表明,寄生电感会使开关过程中的电流、电压出现振荡,影响开关速度和可靠性,并且各部分寄生电感对增强型GaN HEMT的开关过程影响程度不同,在实际PCB布局受到物理限制时,需要根据设计目标优化布局,合理分配各部分寄生电感以获得最优的开关性能。 Parasitic inductance is one of the most important factors affecting the switching characte-ristics of power transistors. And it has a larger influence on the switching behavior of low voltage E-mode gallium nitride high electron mobility transistors(GaN HEMT) with the increase of switching frequency, which limits full utilization of performance advantages of high speed switching in high frequency applications. By establishing mathematical model, the detailed switching process of E-mode GaN HEMT with each parasitic inductance was analyzed theoretically. The duration and influence factors of each stage were derived. A double-pulse test platform was built to confirm individual influence of each parasitic inductance on switching characteristics by the experiment. The test results show that the parasitic induc-tance will induce the oscillation in current and voltage during the switching process and affect the switching speed and reliability. Moreover, each parasitic inductance has different effects on the switching process of E-mode GaN HEMT. Due to physical limits of practical PCB layout, it is necessary to optimize the layout and distribute each parasitic inductance reasonably according to the design requirements to obtain the best switching performance.
作者 彭子和 秦海鸿 修强 张英 荀倩 Peng Zihe;Qin Haihong;Xiu Qiang;Zhang Ying;Xun Qian(College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 211106, China;Division of Electric Power Engineering, Chalmers University of Technology, Goteborg 999034, Sweden)
出处 《半导体技术》 CAS 北大核心 2019年第4期257-264,共8页 Semiconductor Technology
基金 国家自然科学基金资助项目(51677089) 中央高校基本科研业务费专项资金资助项目(NJ20160047) 江苏高校优势学科建设工程资助项目 江苏省研究生科研与实践创新计划项目(KYCX18_0287) 南京航空航天大学研究生创新基地(实验室)开放基金资助项目(kfjj20170308)
关键词 增强型氮化镓(GaN)HEMT 开关行为 寄生电感 双脉冲测试 优化布局 E-mode gallium nitride high electron mobility transistor(GaN HEMT) switching behavior parasitic inductance double-pulse test optimized layout
  • 相关文献

参考文献4

二级参考文献59

  • 1李效白.SiC和GaN电子材料和器件的几个科学问题[J].微纳电子技术,2004,41(11):1-6. 被引量:6
  • 2Mishra U K, Shen Likun, Kazior T E, et al. GaN-based RF power devices and amplifiers [C]. Proceedings of the IEEE, 2008, 96: 287-305.
  • 3Bandic Z Z, Bridger P M, Piquette E C, et al. High voltage (450 V) GaN Schottky rectifiers [J]. Appl Phys Lett, 1999, 74(9): 1266-1268.
  • 4Zhang A P, Johnson J W, Ren F. Lateral AlxGa1-xN power rectifiers with 9.7 kV reverse breakdown volt- age [J]. Appl Phys Lett, 2001, 78(6): 823-825.
  • 5Zhou Y, Wang D, Ahyi C, et al. High breakdown voltage Schottky rectifier fabricated on bulk n-GaN substrate [J]. Solid-state Electronics, 2006, 50(11- 12) : 1744-1747.
  • 6Lee S C, Ha M Woo, Her J C, et al. High breakdown voltage GaN Schottky barrier diode employing floating metal rings on AlGan/GaN hetero-junction [C]. In Proceedings of the 17 International Symposium on Power Semiconductor Devices & ICes (ISPSD), 2005 : 247-250.
  • 7Kamada, Matsubayashi A, Nakagawa K, et al. High- voltage AIGaN/GaN Schottky barrier diodes on Si substrate with low-temperature GaN cap layer for edge termination [C]. In Proceedings of the 20 International Symposium on Power Semiconductor Deviees & IC's (ISPSD) ,2008: 225-228.
  • 8Yoshida S, Ikeda N, Li J, et al. Low on-voltage operation AlGaN/GaN Schottky barrier diode with a du- al Schottky structure [J].IEICE Trans Electron, 2005, E88-C: 690-693.
  • 9Ishida H, Shibata D, Matsuo H, et al. GaN-based natural super junction diodes with multi-channel structures [C]. In IEDM Tech Dig, 2008:145-148.
  • 10Chen Wanjun, Wong King-Yuen, Chen Kevin J. Ingle-chip boost converter using monolithically integrat- ed AIGaN/GaN lateral field-effect rectifier and normally-off HEMT [J]. IEEE Electron Device Letters, 2009, 30(5):430-432.

共引文献68

同被引文献9

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部