高PS材料制备及工艺研究

Manufacture and process of high PS material

本文对高膜厚PS材料进行了研究,通过工艺优化,成功在G5线实现了60～120μm的高PS。通过前烘工艺和固化工艺优化调整,得到了无气泡、膜面良好的高PS材料。本文还对曝光量对PS影响进行了研究,发现曝光量低于50mJ时,PS材料无法有效成型;当曝光量达到150mJ时,得到形貌良好,达到设计值的PS。最后还对不同基底高PS材料进行了研究,发现未进行增粘处理时,SiN基底粘附性良好,Mo基底还需继续优化处理。

The high thickness PS material was studied,through process optimization,60~120μm high PS was prepared successfully in the G5 line.By tuning of VCD & softbake process and curing process,high PS material of no bubble and good membrane surface was obtained.The intensity of exposure influence on the PS was also studied in this paper.When lower than 50 mJ,PS material cannot shape effectively,when amount to 150 mJ,high PS with good appearance,to meet the design value,was received.Finally,the different base of high PS material was studied.When the base did not deal with tackifier,the adhesion of SiN basal was good,but the adhesion of Mo base still needed to optimize the processing.