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Recent progress in atomic layer deposition of molybdenum disulfide:a mini review 被引量:3

原子层沉积二硫化钼的研究进展(英文)
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摘要 As a kind of specially modified chemical vapor deposition (CVD), atom ic layer deposition (ALD) has long been used to fabricate thin films. The self-limiting reaction of ALD endows the films with excellent uniformity and precise controllability. The thickness o f the tilms obtained by ALD can be controlled in an atom ic scale (0.1 nm) on a large-area substrate even with complex structures. Therefore, it has recently been employed to produce the two-dimensional (2D) materials like MoS2. In this mini-review, the research progress in ALD MoS2 is firstly summarized. Then the influences of precursors, substrates, temperature, and post-annealing treatm ent on the quality of ALD-MoS2 are presented. Moreover, the applications of the obtained MoS2 as an electrochemical catalysator are also described. Besides the perspective on the research of ALD of MoS2, the remaining challenges and promising potentials are also pointed out. 作为一种特殊的化学气相沉积技术,原子层沉积在薄膜制造领域得到广泛的应用.得益于自限制化学反应,原子层沉积所制备的薄膜具有优异的均匀性且精确可控.基于原子层沉积技术,在复杂、大面积基底上制备的薄膜厚度可以控制在原子尺度精度(0.1 nm).因此,它已经被用来制备二维MoS2材料.本综述首先介绍了原子层沉积MoS2薄膜的相关研究进展,然后就前驱体、衬底、温度和退火等工艺参数对薄膜质量的影响进行了分析,最后对原子层沉积制备的MoS2在电化学催化领域的应用进行了评论.该综述不仅回顾了原子层沉积MoS2的研究进展,而且指出了尚存的挑战和突破的希望.
作者 Yazhou Huang Lei Liu 黄亚洲;刘磊(Industrial Center, Nanjing Institute of Technology, Nanjing 211167, China;Jiangsu Key Laboratory for Design and Manufacture of Micro-Nano Biomedical Instruments, Southeast University, Nanjing 211189, China)
出处 《Science China Materials》 SCIE EI CSCD 2019年第7期913-924,共12页 中国科学(材料科学(英文版)
基金 financially supported by the National Natural Science Foundation of China (51822501) the Natural Science Funds for Distinguished Young Scholar of Jiangsu Province (BK20170023) the Fundamental Research Funds for the Central Universities (3202006301 and 3202006403) Qing Lan Project of Jiangsu Province the International Foundation for Science, Stockholm, Sweden the Organization for the Prohibition of Chemical Weapons, the Hague, Netherlands, through a grant to Lei Liu (F/4736-2) the grants from Top 6 High-Level Talents Program of Jiangsu Province (2017-GDZB-006, Class A) the Natural Science Foundation of Jiangsu Province (BK20181274) the Scientific Research Foundation of Graduate School of Southeast University (YBPY1703) the Open Research Fund of Jiangsu Key Laboratory for Design and Manufacture of Micro-Nano Biomedical Instruments, Southeast University (KF201806) the Scientific Research Fund of Nanjing Institute of Technology (YKJ201859) the Tribo1ogy Science Fund of State Key Laboratory of Tribology (SKLTKF15A11) Open Research Fund of State Key Laboratory of High Performance Complex Manufacturing, Central South University (Kfkt2016-11) Open Research Fund of State Key Laboratory of Fire Science (HZ2017-KF05) Open Research Fund of State Key Laboratory of Solid Lubrication (LSL-1607)
关键词 MOS2 chemical vapor deposition (CVD) atomiclayer deposition (ALD) two-dimensional (2D) materials 原子层沉积 二硫化钼 化学气相沉积技术 薄膜厚度 MoS2 电化学催化 化学反应 制造领域
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