摘要
In order to improve the damage threshold and enlarge the aperture of a laser beam shaper, photolithographic patterning technology is adopted to design a new type of liquid crystal binary mask. The inherent conductive metal layer of commercial liquid crystal electro-optical spatial light modulators is replaced by azobenzene-based photoalignment layers patterned by noncontact photolithography. Using the azobenzene-based photoalignment layer, a liquid crystal binary mask for beam shaping is fabricated. In addition, the shaping ability, damage threshold, write/erase flexibility and stability of the liquid crystal binary mask are tested. Using a 1 Hz near-IR(1064 nm) laser, the multiple-shot nanosecond damage threshold of the liquid crystal mask is measured to be higher than 15 J/cm^2. The damage threshold of the azobenzenebased photoalignment layer is higher than 50 J/cm^2 under the same testing conditions.
In order to improve the damage threshold and enlarge the aperture of a laser beam shaper, photolithographic patterning technology is adopted to design a new type of liquid crystal binary mask. The inherent conductive metal layer of commercial liquid crystal electro-optical spatial light modulators is replaced by azobenzene-based photoalignment layers patterned by noncontact photolithography. Using the azobenzene-based photoalignment layer, a liquid crystal binary mask for beam shaping is fabricated. In addition, the shaping ability, damage threshold, write/erase flexibility and stability of the liquid crystal binary mask are tested. Using a 1 Hz near-IR(1064 nm) laser, the multiple-shot nanosecond damage threshold of the liquid crystal mask is measured to be higher than 15 J/cm^2. The damage threshold of the azobenzenebased photoalignment layer is higher than 50 J/cm^2 under the same testing conditions.
基金
supported by the International Partnership Program of Chinese Academy of Sciences (No. 181231KYSB20170022)
