T2/TC4在静态人造海水中的电偶腐蚀行为

Galvanic Corrosion Behavior of T2/TC4 Galvanic Couple in Static Artificial Seawater

进行T2/TC4电偶对在静态人造海水中的电偶腐蚀实验,通过电化学工作站、原子发射光谱分析仪、扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)研究T2/TC4在静态人造海水中电偶腐蚀时的铜离子释放速率与腐蚀行为。结果表明:当T2/TC4发生电偶腐蚀时反应强烈,T2为电偶对阳极发生加速腐蚀,TC4为电偶对阴极;与T2自腐蚀相比,T2/TC4电偶腐蚀的铜离子释放速率提高了数十倍,可以维持在160μg/(cm^2·d)左右,能达到抑制大多数海洋生物附着的海洋防污要求;T2自腐蚀的腐蚀产物以Cu_2O为主,与TC4电偶腐蚀后的T2试样表面无腐蚀产物覆盖。

The galvanic corrosion test of T2/TC4 galvanic couple in static artificial seawater was carried out. The dissolution rate of copper ion and the behaviors of T2/TC4 galvanic couple in static artificial seawater were analyzed by electrochemical workstation, ICP,SEM, EDS and XRD. The results show that the reaction is intensive when galvanic corrosion occurs between T2 and TC4 sample. T2 alloy acts as anode and the corrosion rate increases, while TC4 alloy acts as cathode. Compared with the corrosion of T2 sample, the dissolution rate of copper ion by T2/TC4 galvanic corrosion has been enhanced several times and maintains at around 160 μg/(cm^2·d). Therefore marine antifouling requirements for inhibiting the attachment of great majority can be achieved. The corrosion product is mainly Cu2O when corrosion occurs in T2 sample, and no corrosion products are covered on the surface of T2 sample after galvanic corrosion with TC4 alloy.