金属Y和Cr共掺杂W_2N薄膜的力学及摩擦学性能研究

Study of mechanical and tribological properties of Y and Cr co-doped tungsten nitride films

采用磁控溅射法,通过改变氩氮比率,在Si(100)衬底上成功制备了W_2N薄膜,当氩氮比率为20∶6时薄膜的结晶性最好.为了改善W_2N薄膜的力学和摩擦学性能,采用射频和直流磁控共溅射方法分别在Si(100)和A304不锈钢衬底上制备了软质金属Y和硬质金属Cr共掺杂的W_2N (Y-Cr:W_2N)薄膜.在掺杂功率20～50 W范围内,当掺杂功率为30 W时,薄膜具有最大硬度,为23.71 GPa,此时样品的弹性模量为256.34 GPa;当掺杂功率为20 W时,薄膜的平均磨擦系数最小,为0.37.这表明,金属Y和Cr的掺入使W_2N薄膜的力学和摩擦学性能有了很大的改善.

In this paper,well-crystallized W2N films were successfully prepared by magnetron sputtering at Si(100)by changing the argon-nitrogen ratio,and the film with optimal crystallinity was obtained at the argon-nitrogen ratio of 20:6.In order to improve the mechanical and tribological properties of the W2N film,soft metal Y and hard metal Cr co-doped W2N(Y-Cr:W2N)films were prepared by RF and DC magnetron co-sputtering.In the range of doping power 20 to 50 W,at the doping power of 30 W,the maximum hardness of 23.71 GPa and the maximum elastic modulus of 256.34 GPa are obtained.The film has the minimum average tribological coefficient of 0.37 at the doping power of 20 W.With the incorporation of metal Y-Cr,the mechanical and tribological properties of the W2N film have been greatly improved.