摘要
为提高CMP的抛光效果,配制了一种混合磨粒CMP抛光液,用于对不锈钢的抛光。实验结果表明:硅溶胶和铝溶胶配比为4∶1,使用十二烷基硫酸钠为阴离子表面活性剂,调节pH值为2.5配制的抛光液的分散稳定性较好;采用上述抛光液对304号不锈钢进行抛光,其粗糙度和光泽度得到明显提高。
In order to improve the polishing effect of CMP,a mixed abrasive CMP polishing solution is prepared for polishing stainless steel.The results show that the ratio of silica sol to alumina sol is 4 ∶ 1,sodium dodecyl sulfate is used as anionic surfactant,and the polishing solution prepared by adjusting pH value to 2.5 has better dispersion stability.The surface roughness and glossiness of 304 stainless steel are improved obviously by using the polishing fluid.
作者
贺祥
刘军
高爽
耿伟纬
蔡金凤
付慧坛
HE Xiang;LIU Jun;GAO Shuang;GENG Weiwei;CAI Jinfeng;FU Huitan(School of Materials Science and Engineering , Henan University of Technology,Zhengzhou 450001,China)
出处
《河南化工》
CAS
2019年第5期19-21,共3页
Henan Chemical Industry
基金
河南工业大学科学研究基金项目(2017XTCX07)
关键词
化学机械抛光
CMP抛光液
混合磨粒
表面粗糙度
光泽度
chemical mechanical polishing
CMP polishing solution
mixed abrasive grain
surface roughness
glossiness
