光刻机物镜主动阻尼接口设计及测量系统布局

Design of Active Damping Interface for Lens and Layout of Measurement System of Lithography Apparatus

提出一种光刻机物镜主动阻尼接口方案及测量系统布局方案,采用有限元仿真方法评估了在工作台质心变化及动态冲击状态下物镜内部相对静变形及动态响应满足指标需求;结合测量系统布局设计了工作台水平向及垂直向补偿策略,实现了物镜至测量系统间的相对静变形及动态响应满足指标需求;采用机电联合仿真方法评估了物镜主动阻尼方案幅值衰减满足指标需求并通过现场实物开/闭环传函测试验证了仿真的准确性。

An active damping Interface for lens and layout of measurement system of Lithography apparatus are proposed.The relative static deformation and dynamic drift of lens under the change of centre of gravity and dynamic impact of the motion stage are evaluated by finite element simulation method to meet the requirements of the index.Combined with the layout of measurement system,the horizontal and vertical compensation strategies of motion stage are designed.Relative static deformation and dynamic drift between the lens and the measurement system meet the requirement of index.Amplitude reduction of the active damping interface for lens is evaluated by simulation and the accuracy of simulation is verified by physical transmission test.