摘要
针对高热流密度GaN芯片局部点热流的散热特点,采用射流冷却传热方法,对340 W/cm^2的高热流密度进行了冷却,热源以4×4点阵形式存在,实验分析了工质流量、热负荷等因素对系统换热性能的影响。以水为冷却工质,工质流量≤4.47 L/min,试验测得点热源温度低于78.8℃。
In this thesis, considering the heat dissipation characteristics of local heat spot arrays in the GaN chips, the chips were cooled using jet impingement cooling. The maximum heat flux in single heat spot was 340 W/cm^2 and the heat spots array ranged 4×4 in the chips. The influence of thermal performance in cooling system was discussed including flow rate and heat flux. Water was used as the working fluid and the heat flow rate was less than 4.47 L/min. The experimental results show that the temperature of heat spot is less than 78.8 ℃.
作者
铁鹏
程度煦
陈维兵
张志同
鲍桐
Tie Peng;Cheng Duxu;Chen Weibing;Zhang Zhitong;Bao Tong(The 16th Institude of China Electronics Technology Group Corporation,Hefei 230088 ,China;Anhui Province Laboratory of Thermal Management Technology, Hefei 230088, China)
出处
《低温与超导》
CAS
北大核心
2019年第5期55-59,共5页
Cryogenics and Superconductivity
基金
中国电科联合创新基金(6141B08030105)资助
关键词
高热流密度
点热流
强化传热
射流冷却
High heat flux
Local heat flux
Enhanced heat transfer
Jet impingement cooling