滚刷自清洁晶圆片刷洗装置

Wafer Brush-cleaning Equipment with Brush Self-cleaning Function

晶圆片刷洗过程中,滚刷在刷洗晶圆片的同时也会在自身滞留大量脏污,影响下一批次晶圆片的刷洗质量和自身使用寿命,为了解决该问题,本人研究设计了一套滚刷自清洁晶圆片刷洗装置,该装置在对晶圆片进行刷洗同时,也能对自身进行清洁。

During brush-cleaning process,a lot of residuum will be produced on the surface of the brush and this residuum will affect the cleaning effects of the following wafers and the working life of brush.Regarding to this problem,wafer brush-cleaning equipment with brush self-cleaning function is researched and designed.This equipment not only can perform the wafer brush-cleaning,but also can realize self-cleaning.