3A21铝合金阳极氧化膜的原子层沉积封闭工艺

Sealing process for anodic oxide film on 3A21 aluminum alloy by atomic layer deposition

采用原子层沉积(ALD)法对铝合金硫酸阳极氧化膜进行封闭,介绍了其主要工艺流程和参数。通过扫描电镜分析和中性盐雾试验对比了未封孔试样、沸水封闭试样和 ALD 封闭试样的表面形貌和耐蚀性。沸水封闭只能封闭阳极氧化膜的部分微孔,ALD 封闭则可实现完全封闭。ALD 封闭试样的耐蚀性较沸水封闭试样优,中性盐雾试验 450 h 后表面依旧无腐蚀点出现。

The anodic oxide film on aluminum alloy was sealed by atomic layer deposition (ALD). The main process flow and parameters were introduced. The surface morphology and corrosion resistance of unsealed, boiling water-sealed, and ALD-sealed anodic oxide films were compared through electron scanning microscopy and neutral salt spray test. The micropores on anodic oxide film could be sealed partially in boiling water, while completely by ALD technology. The ALD- sealed anodic oxide film did not suffer pitting corrosion after a 450-hour neutral salt spray test, showing better corrosion resistance than the boiling water-sealed one.