石墨靶溅射时间对Ta-C涂层性能的影响

Effect of Sputtering Time of Graphite Target on Properties of Ta-C Coating

采用脉冲磁控溅射在YG10硬质合金基体上制备Ta-C(Tetrahedral amorphous carbon)涂层,通过控制石墨靶溅射时间制备得到不同性能的Ta-C涂层,采用扫描显微镜、纳米压痕仪以及拉曼光谱仪分析了Ta-C涂层的表面形貌、硬度以及sp3与sp2比例,并选取三个典型参数制备Ta-C涂层铣刀进行干式铣削2A50铝合金实验,验证所选石墨靶溅射时间制备的Ta-C涂层的优劣。结果表明:随着石墨靶溅射时间从40 min到80 min逐渐增加,Ta-C涂层的表面形貌质量、硬度、sp3含量以及切削性能呈现先上升后下降的趋势,石墨靶溅射时间55 min制备的Ta-C涂层综合性能最好,硬度达到86.9 GPa,sp3含量较高。石墨靶不同溅射时间制备的Ta-C涂层表面形貌、硬度以及sp3与sp2比例有较大差别,选择合适的溅射时间制备Ta-C涂层工件至关重要,本项研究中石墨靶溅射55 min制备的Ta-C涂层综合性能最优,使用寿命最长,切削性能最好。

The work aims to study the effect of sputtering time of graphite target on the properties of Ta-C coating prepared by pulsed magnetron sputtering on cemented carbide (YG10). The SEM, nanoindentation and Raman spectrometer were used to analyze the surface morphology, hardness and ratio of sp 3 to sp2, then three time points were chosen to deposit Ta-C coating on the milling cutter for dry-type milling of 2A50 aluminum alloy. The advantages and disadvantages of Ta-C coating were observed. The results show with the increase of sputtering time from 40-80 min, the surface morphology, hardness, sp 3 content and cutting performance of Ta-C coating increased first and then decreased. The Ta-C coating prepared by sputtering for 55 min has the best properties: the hardness reached 86.9 GPa and the sp 3 content was relatively high. Thus, the surface morphology, hardness and the ratio of sp 3 to sp2 of Ta-C coating prepared by graphite target sputtering for different time are quite different. It is very important to select the suitable sputtering time to prepare Ta-C coating. In this study, the Ta-C coating prepared by graphite target sputtering for 55 min has the best performance, the longest service life and the best cutting performance.