基于气相法SiO2制备高光泽微孔型成像涂膜的研究

Study on high gloss microporous imaging coatings based on fumed SiO2

以气相法二氧化硅(SiO2)为成孔介质,高聚合度聚乙烯醇(PVA)为成膜物制备了高光泽微孔型涂膜,讨论了硅烷偶联剂KH-790用量、PVA聚合度、AlCl3用量等对微孔成膜及其光泽度、成像耐水性的影响。采用纳米粒径分析仪、打印机,色密度计、光泽度计等对其进行了表征分析。结果表明,KH-790可有效实现气相法SiO2表面改性与分散;交联剂聚酰胺聚脲(PAPU)和AlCl3配合使用可有效实现高聚合度PVA的交联,并降低PVA的交联温度,实现该类微孔型介质涂膜在高分子合成纸上的应用,并制备高光泽微孔型吸墨打印合成纸。

High gloss microporous coatings were prepared by gas phase silica(SiO2) as porous medium and high degree of polymerization polyvinyl alcohol(PVA) as film-forming material.The effects of the dosage of silane coupling agent KH-790,the degree of polymerization of polyvinyl alcohol and the dosage of AlCl3 on the formation,gloss and water resistance of microporous films were discussed.The surface modification and dispersion of SiO2 can be effectively realized by KH-790.The crosslinking of PVA can be effectively realized by the combination of crosslinking agent(PAPU) and AlCl3,and the crosslinking temperature of PVA can be reduced.The application of this kind of microporous medium coating on synthetic paper was realized,and high gloss microporous ink-jet printing synthetic paper was prepared.