摘要
结合近几年的相关研究报道,归纳总结磁控溅射法制备薄膜过程中,工作气体压力变化对膜层沉积速率、膜层形貌和表面粗糙度的影响及相关规律,为磁控溅射制备Mo薄膜、ZnO光学膜层时调控膜层厚度、透光率等性能提供参考。
Based on the related research reports in recent years,this paper summarizes the effects of working gas pressure changes on the deposition rate,film morphology and surface roughness of the film during magnetron sputtering.It provides a reference for controlling the thickness and transmittance of Mo film and ZnO optical film layer by magnetron sputtering.
作者
杨仲秋
YANG Zhong-qiu(Institute of Technical Physics,Heilongjiang Academy of Sciences,Harbin 150001,China)
出处
《黑龙江科学》
2019年第14期38-39,共2页
Heilongjiang Science
关键词
磁控溅射
工作气压
薄膜
Magnetron sputtering
Working pressure
Film