含硅基、芴基的空穴材料制备与结构表征

Preparation and Structure Characterization of Hole Materials Containing Silicon and Fluorene Groups

以三苯基氯硅烷、对溴碘苯、对氯苯硼酸、N-(4-联苯基)-9,9-二甲基-2-氨基芴等为原料通过低温加成、Suzuki偶联及乌尔曼反应合成了含有硅、芴结构的空穴材料.在乌尔曼反应中,通过对Pd催化剂用量的考察,确定了乌尔曼反应催化剂的最低用量为千分之一当量;目标化合物通过热性质分析,确定目标化合物热分解温度为436℃;通过紫外-可见光谱分析,确定目标化合物紫外最大吸收波长为361nm,根据其最大吸收波长(361nm),由光学带隙能公式,得出目标化合物的光学带隙为3.45eV.

A hole material containing silicon and fluorene structure is synthesized with triphenylchlorosilane,p-bromoiodobenzene,p-chlorophenylboronic acid and N-(4-biphenyl)-9,9-dimethyl-2-aminofluorene as raw materials by low temperature addition,Suzuki coupling and Ullmann reaction.In the Ullmann reaction,the minimum amount of catalyst is determined to be 0.1% equivalent by considering the amount of Pd catalyst;the thermal decomposition temperature of target compound is 436℃ which is confirmed by thermal property analysis;The U V-visible spectroscopy analysis is used to determine the maximum absorption wavelength of the target compound which is 361 nm.And according to its maximum absorption wavelength(361 nm),the optical band gap is calculated to be 3.45 eV by optical band-gap energy formula.