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高功率脉冲磁控溅射沉积(AlCrNbSiTiV)N薄膜提升刀具的切削性能 被引量:3

Enhancement of cutting tool with (AlCrNbSiTiV)N film deposited by high-power impulse magnetron sputtering
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摘要 通过高功率脉冲反应磁控溅(HIPIMS)在车刀表面溅镀(AlCrNbSiTiV)N高熵合金氮化物薄膜。研究了溅镀功率(120、150、180、210和240W)对薄膜的形貌、厚度、沉积速率、硬度、弹性恢复率等性质的影响。以50CrMo4铬钼合金钢作为被切削材料,在干式切削条件下考察了切削后工件的表面粗糙度和车刀的腹部磨耗。结果表明,增大溅镀功率可以提高薄膜的硬度和耐磨性,被切削工件的表面质量得到明显的改善,刀具磨损量大大减小。 An AlCrNbSiTiV high-entropy alloy nitride film was sputtered on turning tool by high-power impulse reactive magnetron sputtering (HIPIMS). The effect of sputtering power (120, 150, 180, 210, and 240 W) on the properties such as morphology, thickness, deposition rate, hardness, and elastic recovery of the film was studied. The surface roughness of the 50CrMo4 steel workpiece cut by the sputtered turning tool under dry condition and its flank wear were examined. The results showed that the increase of sputtering power greatly increased the hardness and wear resistance of the film, improved the surface quality of the cut workpiece, and reduced the tool wear.
作者 刘志伟 何靖国 林宇璇 张良超 LIU Zhi-wei;HE Jing-guo;LIN Yu-xuan;ZHANG Liang-chao(Department of Mechanical and Electrical Engineering, Dongguan Polytechnic, Dongguan523808, China)
出处 《电镀与涂饰》 CAS CSCD 北大核心 2019年第13期674-679,共6页 Electroplating & Finishing
基金 广东省教育厅2017年度项目(教育科研重大项目)(2017GGXJK097)
关键词 铝铬铌硅钛钒 高熵合金 氮化物 高功率脉冲反应磁控溅射 纳米压痕 腹部磨耗 aluminum–chromium–niobium–silicon–titanium–vanadium high-entropy alloy nitride high-power impulse reactive magnetron sputtering nanoindentation flank wear
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