半导体极性界面电子结构的理论研究

Theoretical progress of polarized interfaces in semiconductors

半导体电子结构的有效调控一直是人们长期关注的科学问题,也是主流半导体材料物性与器件设计的核心科学问题之一.传统栅极技术只能在小范围内改变半导体材料的带隙,作者从理论上通过人工设计半导体极性界面,产生约10 MV/cm的內建电场,从而实现对Ge、InN等主流半导体带隙在0-2 eV范围内的有效调控,并显著增强Rashba自旋轨道耦合强度,作者进一步利用构建的多带k.p模型证明增强的Rashba自旋轨道耦合可以将常规半导体驱动至拓扑相.文章重点介绍极性半导体InN的极性界面能隙调控;以及Ⅳ族非极性半导体Ge的极性界面能带调控.半导体极性界面的制备与主流半导体工艺兼容,展现了极性界面在主流半导体量子结构的物性调控与光电器件中潜在的应用前景.

The manipulation of electronic structures of conventional semiconductors remains the key issue of modern semiconductor physics and devices. Compare to limited modulation of semiconductors by conventional gate technique, we theoretically demonstrate that, polarized interfaces can generate a strong built-in electric field(about 10 MV/cm) in both polar and non-polar semiconductors, and the polarized interfaces can tune the band gaps in a wide range(approximately 0 -2 eV), and significantly enhances the Rashba spin-orbit coupling strength as well. In this paper, we introduce polarized interfaces in polar semiconductor InN and non-polar semiconductor Ge, and generate topological insulator phases by polarized interfaces. The polarized interface is compatible with conventional semiconductor fabrication techniques and shows interesting physics and potential optoelectronic applications.