利用双光子聚合在非透明基底上制备微结构

Fabrication of microstructures on non-transparent substrates by two-photon polymerization

在不改变双光子聚合微加工设备结构的基础上,介绍了利用环绕字母数字螺旋塔,在以铜片和硅片为代表的2种非透明基底上进行光刻,根据所光刻的图案,分别得出在铜片和硅片上的有效光刻距离区间以及最佳光刻距离,总结出成熟的非透明基底上光刻微结构的方法,分别在2种不透明基底上光刻二维和三维立体图案,清晰的图案说明在非透明基底上光刻方法有效可行.研究结果可为诸多双光子聚合设备在非透明基底上光刻提供参考,并有助于双光子聚合在光学微器件、微机电系统、生物组织工程等领域发挥更大的作用.

The technology of femtosecond laser two-photon polymerization micromachining plays an important role in the micro-nano-processing-related fields. However, in many cases, the equipment for femtosecond laser two-photon polymerization processing cannot prepare microstructures on non-transparent substrates due to the problems rising from optical path. Based on the structure of the non-changing two-photon polymerization micromachining equipment, the authors introduce the use of a surrounding alphanumeric spiral tower for lithography on two non-transparent substrates represented by copper and silicon wafers. By observing the lithographic pattern, the effective lithographic distance interval and the optimal lithography distance on the copper and silicon wafers are respectively obtained. The two-dimensional and three-dimensional patterns are lithographically etched on two non-transparent substrates respectively. The clearly obtained pattern indicates that the lithography method is effective and feasible for the non-transparent substrate. In this research, supported by the results, the methods are summarized for lithography of two-photon polymerization equipment on non-transparent substrates, which facilitates two-photon polymerization in optical micro-devices, MEMS, and biological tissue engineering.