摘要
低温等离子体技术是一种集化学、物理学、生物学于一体的高级新型氧化技术,由于它具有极强的氧化能力及对环境友好等优点,被定义为当今最具有前景的高级氧化技术之一。介绍了几种不同的等离子体激发形式,并重点分析了输入能量、放电气体、初始浓度等多种因素对等离子体作用的影响。最后展望了该技术的未来发展方向。
Low temperature plasma technology is a new advanced oxidation technology which integrates chemistry, physics and biology. It is defined as one of the most promising advanced oxidation technologies because of its strong oxidation ability and environmental friendliness. In this paper, several different forms of plasma excitation are introduced, and the effects of input energy, discharge gas, initial concentration and other factors on plasma interaction are emphatically analyzed. Finally, some prospects for the future development of this technology are put forward.
作者
何媛
王姝
阎勇
孙消消
胡红伟
杨少鹏
戴云鹏
杨策
HE Yuan;WANG Shu;YAN Yong;SUN Xiao-xiao;HU Hong-wei;YANG Shao-peng;DAI Yun-peng;YANG Ce(School of Chemical Engineering,Anhui University of Science and Technology,Huainan 232001,China)
出处
《安徽化工》
CAS
2019年第4期20-22,共3页
Anhui Chemical Industry
关键词
低温等离子体
废水处理
影响因素
影响规律
low temperature plasma
wastewater treatment
factors affecting
rule affecting