接触式轮廓仪探针状态检查图形样块的研制

Development of the Inspection Pattern Specimen for the Contact Profiler Stylus State

针对接触式轮廓仪存在的探针沾污、探针缺陷、扫描位置不准的问题,采用半导体工艺技术在硅晶圆片上制备出探针状态检查样块。该样块具有探针沾污及缺陷检查图形和探针扫描位置检查图形,可实现探针针尖10个位置沾污和缺陷的检查以及偏移量为-150~150μm内探针扫描位置的检查。使用探针状态检查样块对一台型号为P-6的接触式轮廓仪进行了检查,实验结果表明:该样块能够准确判断出轮廓仪存在探针缺陷和扫描位置不准的问题,进而有助于接触式轮廓仪探针的故障检查和维修。

In order to resolve the problems of stylus contamination,stylus defects and inaccurate scanning position in the stylus profiler,a stylus state inspection specimen was prepared on the silicon wafer using the semiconductor process technology.The specimen had a stylus contamination and defect inspection pattern and a stylus scanning position inspection pattern,which could inspect the contamination and defects of the stylus tip at 10 positions,and the stylus scanning position in the offset range from -150μm to 150μm.A contact profiler of type P-6 was inspected using the stylus state inspection specimen.The experimental results show that the specimen can accurately determine the problems of stylus defects and inaccurate scanning position of the profiler, which facilitates fault inspection and repair of the contact profiler stylus.