基于STM32离子注入机剂量检测控制器的设计

Design of Dose Detection Controller Based on STM32 Ion Implanter

设计了一种基于STM32F407微处理器的离子注入机剂量检测控制器,首先介绍了剂量控制器的整体设计和工作原理及如何实现离子束流精确检测、按设定的剂量均匀地注入到晶片表面,然后对控制器的电流/电压变换、峰值检测、校准电流源、模/数转换等硬件电路设计和控制软件设计作了详细的介绍;实验结果表明该控制器实现了大范围束流的快速量程切换,量程切换时间达到1ms以上,束流测量精度小于0.4%,最小量程低至2μA,测量漂移精度小于0.3%,该控制器结构简单,工作稳定可靠,有广泛的应用前景。

This paper designs a dose detection controller for ion implanter based on STM32F407 Microprocessor. Firstly, it introduces the overall design and working principle of the dose detection controller and how to realize the accurate detection of ion beam current and uniformly inject ion dose into the wafer surface. Then it details hardware circuit design and control software design for current/voltage conversion, peak detection, calibration current source, analog/digital conversion of controller. The experimental results show that the controller achieves fast range switching over a wide range of beams. The switching time is more than 1ms, the accuracy of beam measurement is less than 0.4%, the minimum range is as low as 2 μA, and the measurement drift accuracy is less than 0.3%. The controller has simple structure, stable and reliable operation, and has broad application prospects.