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Etching‐assisted femtosecond laser modification of hard materials 被引量:7

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摘要 With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard materials. However, the low efficiency, low precision and high surface roughness are the main stumbling blocks for femtosecond laser processing of hard materials. So far, etching- assisted femtosecond laser modification has demonstrated to be the efficient strategy to solve the above problems when processing hard materials, including wet etching and dry etching. In this review, femtosecond laser modification that would influence the etching selectivity is introduced. The fundamental and recent applications of the two kinds of etching assisted femtosecond laser modification technologies are summarized. In addition, the challenges and application prospects of these technologies are discussed.
出处 《Opto-Electronic Advances》 2019年第9期1-14,共14页 光电进展(英文)
基金 This work was supported by the National Key Research and Development Program of China and National Natural Science Foundation of China (NSFC) under Grants 2017YFB1104300,61590930,61825502,61805098 and 61960206003.
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