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Negative transconductance effect in p-GaN gate AlGaN/GaN HEMTs by traps in unintentionally doped GaN buffer layer

Negative transconductance effect in p-GaN gate AlGaN/GaN HEMTs by traps in unintentionally doped GaN buffer layer
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摘要 We investigate the negative transconductance effect in p-GaN gate AlGaN/GaN high-electron-mobility transistor(HEMT) associated with traps in the unintentionally doped GaN buffer layer. We find that a negative transconductance effect occurs with increasing the trap concentration and capture cross section when calculating transfer characteristics.The electron tunneling through AlGaN barrier and the reduced electric field discrepancy between drain side and gate side induced by traps are reasonably explained by analyzing the band diagrams, output characteristics, and the electric field strength of the channel of the devices under different trap concentrations and capture cross sections. We investigate the negative transconductance effect in p-GaN gate AlGaN/GaN high-electron-mobility transistor(HEMT) associated with traps in the unintentionally doped GaN buffer layer. We find that a negative transconductance effect occurs with increasing the trap concentration and capture cross section when calculating transfer characteristics.The electron tunneling through AlGaN barrier and the reduced electric field discrepancy between drain side and gate side induced by traps are reasonably explained by analyzing the band diagrams, output characteristics, and the electric field strength of the channel of the devices under different trap concentrations and capture cross sections.
作者 Mei Ge Qing Cai Bao-Hua Zhang Dun-Jun Chen Li-Qun Hu Jun-Jun Xue Hai Lu Rong Zhang You-Dou Zheng 葛梅;蔡青;张保花;陈敦军;胡立群;薛俊俊;陆海;张荣;郑有炓(The Key Laboratory of Advanced Photonic and Electronic Materials,School of Electronic Science and Engineering,Nanjing University,Nanjing 210093,China;Department of Physics,Changji College,Changji 831100,China;School of Electronic Science and Engineering,Nanjing University of Posts and Telecommunications,Nanjing 210023,China)
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第10期504-509,共6页 中国物理B(英文版)
基金 Project supported by the National Key Research and Development Program of China(Grant No.2017YFB0402900) the National Natural Science Foundation of China(Grant No.61634002) the Scientific Research Foundation of Graduate School of Nanjing University,China(Grant No.2016CL03) the Key Project of Jiangsu Province,China(Grant No.BE2016174)
关键词 AlGaN/GaN HIGH-ELECTRON-MOBILITY transistors(HEMTs) traps NEGATIVE TRANSCONDUCTANCE AlGaN/GaN high-electron-mobility transistors(HEMTs) traps negative transconductance
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