摘要
利用Arrhenius公式对化学气相沉积的反应进行研究 ,设计了一种低压热化学气相沉积 (LPCVD)高效沉积反应室。在料管的下方与衬底的上方间安放漏斗型筛板 ,在工艺中有效地提高了氢气的分压 ,并有利于衬底温度的提高 ,加快了沉积速率。通过对设计前后钨薄膜的金相组织对比分析后发现 ,较高的沉积速率可以使沉积薄膜晶粒细小 ,结构致密 ,但薄膜与衬底附着力较差 ,提高衬底温度可有效地提高薄膜与衬底附着力 ,以弥补因较高的沉积速率带来的薄膜与衬底附着力较差的问题 ,提高薄膜质量。
A high\|efficient chamber for Coating was designed for low pressure chemical vapor deposition (LPCVD). A funnel screen was placed between feed tube and substrate, which improved the partial pressure of hydrogen effectively and helped for rising temperature of substrate and depositing rate. Comparing the metallographic structures of tungsten coating before and after designing, results showed that high depositing rate made the grain of coating more small and the structure more compact, but low adhesion between coating and substance. Rising temperature could increase the adhesion to make up the adhesion loss caused by high depositing rate and improve the quality of coating.
出处
《材料保护》
CAS
CSCD
北大核心
2002年第10期36-37,共2页
Materials Protection