摘要
A process suitable for production on a large scale of cold light mirror for film projector is introduced. Deposition parameters required for producing TiO 2/SiO 2 optical multilayer systems by electron beam evaporation of TiO 2 and SiO 2 starting materials are investigated. Manufacture and techniques of cold mirror and the adhesion,stability, wear and corrosion resistance of cold mirror by this process are discussed. The result shows that cold mirror produced has good optical properties and better adhesion.
A process suitable for production on a large scale of cold light mirror for film projector is introduced. Deposition parameters required for producing TiO 2/SiO 2 optical multilayer systems by electron beam evaporation of TiO 2 and SiO 2 starting materials are investigated. Manufacture and techniques of cold mirror and the adhesion,stability, wear and corrosion resistance of cold mirror by this process are discussed. The result shows that cold mirror produced has good optical properties and better adhesion.
